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Progress made in developing fluorine-enriched, high-frequency and low-k dielectrics
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Progress made in developing fluorine-enriched, high-frequency and low-k dielectrics
Summary: In January 2018, SIOC, CAS unveiled its progress made in developing fluorine enriched high frequency and low-k dielectricsOn 9 Jan., 2018, Shanghai Institute of Organic Chemistry, Chinese Academy of Sciences (SIOC, CAS) announced its progres...
China Fluoride Materials Monthly Report 201801
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